We use cookies on this site. By browsing our site you agree to our use of cookies. Close this message Find out more

Home > Physics home > About us > Facilities > Fabrication
More in this section Fabrication



The Physics department has significant fabrication capability. This is essential for development of new nano devices, growth of novel and interesting crystals, modifications to existing research devices and design and construction of completely novel devices.

Read more about our fabrication facilities below.

Crystal Growth

The Crystal Growth Laboratory prepares the large single crystals necessary to investigate new states of electronic quantum matter by neutron scattering. Members of the Biodiagnostics research group use this facility. 


Scanning electron microscope

 facilitiesWe have a JEOL 6460 SEM Scanning Electron Microscope combined with a Nanomaker writing system. It is equipped with both secondary and backscattered electrons detectors for imaging. A resolution 5nm can be achieved at the maximum accelerating voltage of 30 kV and low probe current. The Microscope is equipped with electrostatic beam blanker and integrated with a Nanomaker beam writer system. It converts SEM to Electron Beam Lithograph meaning Semiautomatic mark detection with high precision alignment is available. The probe current is accurately measured by picoammeter. The easy-to-use pattern generator includes proximity correction and development simulation tools.

Ultra high vacuum system 


Our ultra-high vacuum system was built by Kurt J. Lesker. It comprises two vacuum chambers with a transfer gate. It is able to achieve ultra-high vacuums and is equipped with electron beam and thermal sources. In situ etching with an ion gun is available. 

Electron beam evaporator


We have an Edwards 500 electron beam system, which includes thermal evaporation source and an Ion gun for in situ ion etching installed in the Extension mini-chamber. It is set up for a variety of materials. Both automatic and manual evaporation regimes are available.

Reactive Ion Etching system


Our Plasmalab 80plus Reactive Ion Etching system was built by Oxford Instrument. It is equipped with a laser interferometer end point detector. Oxygen, Argon, SF6, CF4 and CHF3 set of gases provide a variety of processes for different materials.

Probe station 


It is important to be able to test electrical properties of nanostructures within the clean room, before you bond your structure or mount it in cryostat. High precision manipulator probes are connected to voltmeter-sources. Probe leads can be manipulated to make contact to microstructures under optical microscopes. Current-Voltage characteristics of nanostructures are measured and recorded by a computer program.

Bonder and profilemeter 


We have a wire bonder. A large proportion of research projects in our Department include transport measurements at low temperatures. Wire bonder is used to connect samples to standard package circuits or sample holders. Thin Al or Au wire can be attached to contact pads of a few hundred microns in size under an optical microscope. The Alpha-Step IQ is a state-of-the-art, stylus-based surface profiler that combines high measurement precision with versatility. It is one of the busiest pieces of equipment in our nanolab. It provides quick measurements of profile with accurate measurements of thickness. It is widely used to develop various etching and deposition processes.




Comment on this page

Did you find the information you were looking for? Is there a broken link or content that needs updating? Let us know so we can improve the page.

Note: If you need further information or have a question that cannot be satisfied by this page, please call our switchboard on +44 (0)1784 434455.

This window will close when you submit your comment.

Add Your Feedback